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Analysis of Optical Thin Films and Films on PET – A Few Examples (Ref: Ellipso Technology) |
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1. Reflectivity of Camera Phone Lens : Effect of ARC |
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Reflectivities of camera phone lens are compared. The reflection spectra of lenses before they are anti-reflection coated(upper middle), and after they are anti-reflection coated(upper right) are shown.
Thickness of ARC film is 58.4 nm. Reflectivity decreases from ~10 % to 2~4 % after AR coating. Backside reflection from the opposite side of lens is included. |
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2. MgO-LiNbO3 / Epoxy on LiNbO3 |
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Thickness
MgO-LiNbO3: 5995.43 nm
Epoxy : 382.41 nm |
R.I.(@633 nm)
MgO-LiNbO3 : 2.206
Epoxy : 1.7251 |
Substrate : LiNbO3 |
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3-1. Ag Doped TiO2 on Glass |
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Thickness : 157.65 nm |
Substrate : Glass |
R.I. Dispersion |
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3-2. Co Doped TiO2 on Glass |
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Thickness : 165.65 nm |
Substrate : Glass |
R.I. Dispersion |
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4-1. TiNx on Glass |
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Thickness : TiNx 10.363 nm |
Substrate : Glass |
R.I. Dispersion of TiNx |
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5-1.Cr on Glass |
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Thickness : Cr 32.091 nm |
Substrate : Glass |
R.I. Dispersion of Cr |
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6-1. NiO on c-Si |
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Thickness : NiO 35.522 nm |
Substrate : Crystalline Silicon |
R.I. Dispersion of NiO |
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7-1. Primer on PET(Mitsubishi) |
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Thickness : Primer 80.847 nm |
Substrate : PET(Mitsubishi) |
R.I. Dispersion of Primer |
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7-2. Primer on PET(Toyobo) |
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Thickness : Primer 78.857 nm |
Substrate : PET(Toyobo) |
R.I. Dispersion of Primer |
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7-3. Primer on PET(Toyobo_low-Oligomer) |
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Thickness : Primer 60.209 nm |
Substrate : PET(Toyobo_Low-Oligomer) |
R.I. Dispersion of Primer |
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8-1. Hard Coating/Primer on PET |
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Thickness of Film (From Top) :
Hard Coating = 963.42 nm
Primer = 58.38 nm |
Substrate = PET |
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9-1. LR/HR on PET |
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λ-min analysis technique and m-FFT analysis technique are applied simultaneously to obtain thickness of LR and that of HR, respectively, at the same time. LR(~100 nm) and HR(~μm) are coated on PET. |
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LR Thickness 113.0 nm |
HR Thickness 1750.0 nm |
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10-1. Low RI/High RI/Hardcoating/Primer on PET |
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Thickness : Low RI 16.336 nm
High RI 54.397 nm
Hardcoating 1721.137 nm
Primer 100 nm |
Substrate : PET |
R.I. Dispersion of Low RI / High RI |
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11. Depth Profile of MgF2 AR Coating |
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Thickness of Film (From Top)
P(Protection Layer)-Layer = 33.63 nm
MgF2(55 %) + void(45 %) = 61.83 nm
MgF2 (125 %) + void(-25 %) = 1109.9 nm
Substrate : PET(94.6 %) + void(5.6 %) |
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12-1. AF/SiO2/SiN/SiO2/SiN/SiO2/SiN on Glass |
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Layers(From Top) : SiO2 (17.4%) + void(82.6%) 11.667 nm
SiO2 (100%) 56.503 nm
SiN (92.6%) + void(7.4%) 74.035 nm
SiO2 (100%) 21.470 nm
SiN (88.7%) + void(11.3%) 42.155 nm
SiO2 (100%) 69.977 nm
SiN (81.1%) + void(18.9%) 135.159 nm |
Substrate : Glass |
R.I. Dispersion of SiO2(17.4%) AF Layer |
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12-2. SiO2/TiO2/SiO2/TiO2/SiO2/TiO2/SiO2/TiO2/SiO2 on c-Si(9L) |
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Thickness : SiO2 (Top)-9L 76.462 nm
TiO2 – 8L 33.612 nm
SiO2 – 7L 120.040 nm
TiO2 - 6L 37.866 nm
SiO2 – 5L 195.399 nm
TiO2 – 4L 41.267 nm
SiO2 - 3L 368.989 nm
TiO2 – 2L 68.126 nm
SiO2 - 1L 360.651 nm |
Substrate : Crystalline Silicon |
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12-3. SiO2/Ti3O5/ SiO2/Ti3O5/ SiO2/Ti3O5/ SiO2 on TaF1(Glass) |
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Thickness : Ti3O5 : 38.869 nm |
R.I : Dispersion of Ti3O5 |
Substrate : TaF1(Glass) |
Layer 07(Top) : SiO2 112.394 nm
Layer 06 Ti3O5 38.869 nm
Layer 05 SiO2 20.282 nm
Layer 04 Ti3O5 40.198 nm
Layer 03 SiO2 49.685 nm
Layer 02 Ti3O5 15.084 nm
Layer 01 SiO2 57.093 nm
Substrate TaF1(Glass) |
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13. Color Filters (Red, Green, Blue) |
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13-1. Red on c_Si |
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13-2. Green on c_Si |
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13-3. Blue on c_Si |
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14-1. PHPS on SiO2 |
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Thickness : PHPS 21.158 nm |
R.I. Dispersion of PHPS |
Substrate : SiO2 |
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15-1. Poly Siloxane on c-Si |
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Thickness : P-S 145.589 nm |
R.I. Dispersion of Poly siloxane |
Substrate : Crystalline Silicon |
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16-1. CN on c-Si |
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Thickness : CN 412.209 nm |
R.I. Dispersion of CN |
Substrate : Crystalline Silicon |
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17-1. BN on c-Si |
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Thickness : BN 396.256 nm |
R.I. Dispersion of BN |
Substrate : Crystalline Silicon |
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18-1. BCN on c-Si |
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Thickness : BCN 506.746 nm |
R.I. Dispersion of BCN |
Substrate : Crystalline Silicon |
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